research
∙
10/02/2018
An Automated System for Checking Lithography Friendliness of Standard Cells
At advanced process nodes, lithography weakpoints can exist in physical ...
share
research
∙
08/16/2018
Context-Aware DFM Rule Analysis and Scoring Using Machine Learning
To evaluate the quality of physical layout designs in terms of manufactu...
research
∙
08/16/2018
Creation and Fixing of Lithography Hotspots with Synopsys Tools
At advanced process nodes, pattern matching techniques have been used in...
research
∙
05/28/2018
Standard Cell Library Evaluation with Multiple lithography-compliant verification and Improved Synopsys Pin Access Checking Utility
While standard cell layouts are drawn with minimum design rules to maxim...
research
∙
05/28/2018
Multiple-Lithography-Compliant Verification for Standard Cell Library Development Flow
Starting from 22-nm, a standard cell must be designed to be full lithogr...
research
∙
05/25/2018
Advanced In-Design Auto-Fixing Flow for Cell Abutment Pattern Matching Weakpoints
Pattern matching design verification has gained noticeable attention in ...
research
∙
05/25/2018
In Design DFM Rule Scoring and Fixing Method using ICV
As compared to DRC rules, DFM rules are a list of selected recommended r...
research
∙
05/25/2018
