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05/28/2018
Standard Cell Library Evaluation with Multiple lithography-compliant verification and Improved Synopsys Pin Access Checking Utility
While standard cell layouts are drawn with minimum design rules to maxim...
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05/28/2018
Multiple-Lithography-Compliant Verification for Standard Cell Library Development Flow
Starting from 22-nm, a standard cell must be designed to be full lithogr...
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05/25/2018
Advanced In-Design Auto-Fixing Flow for Cell Abutment Pattern Matching Weakpoints
Pattern matching design verification has gained noticeable attention in ...
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05/25/2018
